≥1×10¹⁰ Ω・cm (especificação elétrica do núcleo HPSI)
Tratamento de superfície:
Polimento de espelho CMP unilateral/dupla face
Densidade de Micropipe:
Grau de produção em massa ≤1 ea/cm²
Descrição do produto
Information of HPSI SiC Wafers HPSI (High Purity Semi-Insulating) silicon carbide wafers are critical foundational substrates for high-frequency GaN RF devices and advanced third-generation semiconductors. With the rapid expansion of 5G communication, millimeter-wave radar and aerospace electronics markets, the global SiC substrate market is projected to exceed USD 2 billion by 2030, playing an irreplaceable strategic role in next-generation wireless communication and high